Rubber
Comprehensive range of rubber (synthetics) compounds
A comprehensive range of rubber (synthetic) compounds are available for the recovering of your rollers. Selecting the correct rubber compound to use is essential, especially where solvent or chemical attack is a consideration. Failure to select the correct rubber compound is often a factor in the failure or reduced life of a roller covering.
Typical applications for our rubber products include:
- Coating.
- Printing (Flexo, Litho, Gravure).
- Conveying.
- Varnishing.
- Gluing.

EPDM
Resistance: Excellent resistance to ketone and ester based solvents (i.e. acetone), certain acids, alkali’s, water and steam.
Applications include: Coating, laminating, varnishing (where solvent attack is a consideration). Etching, rinsing and squeegee applications in a wide range of industries.
Maximum working temperature: 140oC
Nitrile / Neoprene
Resistance: Alcohols, vegetable and mineral oils. Nitrile also has a good resistance to aromatic solvents (i.e. toluene).
Applications include: Printing, gluing, varnishing, mechanical feed and drive rollers. Food quality grades are available.
Maximum working temperature: 100oC
Hypalon
Resistance: Excellent cut and abrasion resistance. Acid and alkali resistance.
Applications include: Good load bearing and bond strength allows for use for embossing, pressure backing rollers in printing, laminating and paper/film conversion. Used in various acid and alkali treatment processes as squeegee, nip and conveyor rollers in industries as diverse as steel production to PCB manufacture.
Maximum working temperature: 140oC
Carboxylated Nitrile
Resistance: In a word ‘tough’. Improved cut, abrasion and load bearing characteristics over Hypalon.
Applications include: Used in embossing, mangle, conveyors etc, as well as various high temperature/pressure waxing and coating applications.
Maximum working temperature: 120oC
All information on this website is intended for general information. For a recommendation on a specific application, please Contact Us.